发明名称 Method of fabrication of a microstructure having an inside cavity
摘要 <p>The present invention relates to a method of fabricating a microstructure having an inside cavity comprising the steps of: depositing a first layer or a first stack of layers in a substantially closed geometric configuration on a first substrate; performing an indent on the first layer or on the top layer of said first stack of layers; depositing a second layer or a second stack of layers substantially with said substantially closed geometric configuration on a second substrate; aligning and bonding said first substrate on said second substrate such that a microstructure having a cavity is formed according to said closed geometry configuration. <IMAGE></p>
申请公布号 EP0951068(A1) 申请公布日期 1999.10.20
申请号 EP19980870132 申请日期 1998.06.10
申请人 INTERUNIVERSITAIR MICRO-ELEKTRONICA CENTRUM VZW;C.P. CLARE CORP. 发明人 TILMANS, HENDRIKUS A.C.;BEYNE, ERIC;VAN DE PEER, MYRIAM D.J.
分类号 B81C1/00;B81B7/00;G01L9/00;G01P15/08;G01P15/125;H01H1/00;H01H35/14;H01L23/02;H03H3/007;(IPC1-7):H01L23/10 主分类号 B81C1/00
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