发明名称 |
Method of fabrication of a microstructure having an inside cavity |
摘要 |
<p>The present invention relates to a method of fabricating a microstructure having an inside cavity comprising the steps of: depositing a first layer or a first stack of layers in a substantially closed geometric configuration on a first substrate; performing an indent on the first layer or on the top layer of said first stack of layers; depositing a second layer or a second stack of layers substantially with said substantially closed geometric configuration on a second substrate; aligning and bonding said first substrate on said second substrate such that a microstructure having a cavity is formed according to said closed geometry configuration. <IMAGE></p> |
申请公布号 |
EP0951068(A1) |
申请公布日期 |
1999.10.20 |
申请号 |
EP19980870132 |
申请日期 |
1998.06.10 |
申请人 |
INTERUNIVERSITAIR MICRO-ELEKTRONICA CENTRUM VZW;C.P. CLARE CORP. |
发明人 |
TILMANS, HENDRIKUS A.C.;BEYNE, ERIC;VAN DE PEER, MYRIAM D.J. |
分类号 |
B81C1/00;B81B7/00;G01L9/00;G01P15/08;G01P15/125;H01H1/00;H01H35/14;H01L23/02;H03H3/007;(IPC1-7):H01L23/10 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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