发明名称 Ta TARGET FOR FILM-FORMING BARRIER MATERIAL AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To produce a Ta target capable of stably executing the production of a tin film and to provide a method for producing it. SOLUTION: This Ta target for film-forming a barrier material is the one in which the powder of one or >= two kinds among (C, B, Ir, W, Ge, CeO2 and RuO2) of <=49 atomic% and Ta powder of >=51 atomic% are sintered. The target can be obtd., e.g. by subjecting the powder of one or >= two kinds among (C, B, Ir, W, Ge, CeO2 and RuO2) of <=49 atomic% and Ta powder of >=51 atomic% to pressure sintering at >=700 deg.C under >=50 MPa.
申请公布号 JP2000355761(A) 申请公布日期 2000.12.26
申请号 JP19990170647 申请日期 1999.06.17
申请人 HITACHI METALS LTD 发明人 KAN TAKESHI;TAKASHIMA HIROSHI;KUBOI TAKESHI;MURATA HIDEO
分类号 C23C14/34;H01L21/285;(IPC1-7):C23C14/34 主分类号 C23C14/34
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