| 摘要 |
PROBLEM TO BE SOLVED: To provide a new positive resist composition containing a resin having a specified structural unit.SOLUTION: The positive resist composition contains a resin having a structural unit expressed by formula (I) and an acid generator. In the formula, Rand Reach represent an aliphatic hydrocarbon group, or Rand Rare bonded with each other to form a ring together with a carbon atom to which they are bonded; Rrepresents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Trepresents a divalent aliphatic saturated hydrocarbon group or the like; and m represents an integer of 0 or 1. |
