| 摘要 |
PROBLEM TO BE SOLVED: To provide an observation device which exerts no effect on the edge face part of a substrate because the observation device is not brought into contact with the edge face part of the substrate and enables the observation adapted even to the surface deflection or the like caused by the shape such as warpage or the like of a wafer, and a flaw inspection device of the edge face of the substrate. SOLUTION: The observation device includes an imaging device for imaging the edge face part of the substrate, a rotatable holding part for holding the substrate, a displacement detection part for detecting the fluctuation quantity of the position of the edge face part of the substrate, a display part for displaying the captured image and a control part for performing control so that the image of the edge face of the substrate, which is captured by the imaging part, is observed on the display part at a definite position on the basis of the signal from the displacement detection part. The edge face flaw inspection device is also disclosed. COPYRIGHT: (C)2007,JPO&INPIT
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