发明名称 Very narrow band injection seeded F2 lithography laser
摘要 <p>An apparatus comprises a seed laser and an amplifier laser in communication with a processing device utilizing output light produced by the seed laser and amplifier laser device. The apparatus further comprises a laser controller for outputting a laser trigger signal. The seed laser excites a laser gas by a seed laser discharge caused by application of a seed laser discharge voltage across seed laser electrodes. The seed laser electrodes are disposed in a seed laser chamber where the laser gas is contained, from a seed laser discharge circuit. The seed laser discharge excites the laser gas in response to an input of the laser trigger signal to generate a seed laser light, and oscillates the seed laser light with a wavelength band being narrowed by a band narrowing unit including a grating. An amplifier amplifies the seed laser light by an amplifier discharge caused by amplification of an amplifier discharge voltage across amplify electrodes. The amplify electrodes are disposed in an amplifier chamber where the laser gas is sealed by means of an amplifier discharge circuit in response to an input of the laser trigger signal to emit an amplified laser output light to the processing device. A delay circuit sets a delay from light emission of the seed laser light to a start of the amplification discharge. The laser controller changes the delay time to synchronize the amplification discharge with the seed laser light.</p>
申请公布号 EP1944841(A2) 申请公布日期 2008.07.16
申请号 EP20080000225 申请日期 2000.09.19
申请人 CYMER, INC. 发明人 ERSHOV, ALEXANDER, I.;ONKELS, ECKEHARD, D.;DAS, PALASH, P.;PARTLO, WILLIAM, N.;HOFMANN, THOMAS
分类号 H01S3/10;G03F7/20;H01S3/03;H01S3/036;H01S3/038;H01S3/08;H01S3/0943;H01S3/097;H01S3/0971;H01S3/102;H01S3/139;H01S3/223;H01S3/225;H01S3/23 主分类号 H01S3/10
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