Method for aligning substrates in different spaces and having different sizes

摘要

A method for aligning substrates in different spaces and having different sizes includes: capturing actual local images of two substrates; comparing specific marks in standard local feature regions of the two substrates, and obtaining specific marks in actual local feature regions of the two substrates; separately establishing actual coordinate systems of the two substrates to synthesize aligned assembly coordinate system; comparing coordinate values of the specific marks of the two substrates in the two actual coordinate systems to obtain first group of offsets, and comparing sizes of the two substrates to obtain a size difference; using the first group of offsets and the size difference to correct coordinate values of specific marks of one of the two substrates; comparing coordinate values of the specific marks of the two substrates, to obtain second group of offsets; and moving the one to a position compensated by the second group of offsets.

主权项

1. A method for aligning substrates in different spaces and having different sizes, comprising following steps of:
capturing at least two actual local images of each of two substrates in a first waiting space and a second waiting space and having different sizes by using two calibrated image capturing units in the first waiting space and two calibrated image capturing units in the second waiting space; separately making comparison with specific marks or specific shapes in standard local feature regions of each of the two substrates, and obtaining specific marks or specific shapes in at least two actual local feature regions of each of the two substrates; separately establishing actual coordinate systems of the two substrates so as to synthesize an aligned assembly coordinate system; comparing coordinate values of the specific marks or specific shapes of the two substrates in the two actual coordinate systems so as to obtain a first group of offsets, and comparing sizes of the two substrates so as to obtain a size difference; correcting coordinate values of specific marks or specific shapes of one of the two substrates by using the first group of offsets and the size difference; comparing the corrected coordinate values of the specific marks or specific shapes of the one of the two substrates in the two actual coordinate systems with coordinate values of specific marks or specific shapes of the other one of the two substrates, so as to obtain a second group of offsets; moving the one of the two substrates to a position compensated by the second group of offsets; moving the one in the two substrates from the first waiting space to an aligned assembly space by using a first predetermined amount of movement; and moving the other one of the two substrates from the second waiting space to the aligned assembly space by using a second predetermined amount of movement.