| 摘要 |
<p>The polishing head comprises a structure (3), mounted to rotate about an axis (AA'), carrying several surfacing pads (4) with an abrasive block (5). Each pad is supported on a pivot (10) engaged in a bearing (9) in the structure (3). The structure (3) and the pads are driven to rotate about the axis (AA'), and the pads are made to pivot about their support axes (BB'). The pivoting movement is caused by a rotary shaft (15) and an eccentric disc (16) mounted to rotate in a collar (17). The movement of the collar (17) induced an oscillatory movement about the axis (BB') for each of the pads. <IMAGE></p> |
