发明名称 HERSTELLUNGSPROZESS FÜR KRISTALLINISCHE TITANDIOXID-SILIKA-MISCHPARTIKEL MIT HOHER SCHÜTTDICHTE, HIERDURCH ERHALTENE KRISTALLINISCHE TITANDIOXID-SILIKA-MISCHPARTIKEL SOWIE DEREN VERWENDUNG
摘要 <p>A process for producing titania-silica mixed crystal particles having a high bulk density and comprising titanium oxide as the main component and silicon oxide as a subsidiary component, the process comprising decomposing a gaseous titanium halide and a gaseous silicon halide, each heated at 600° C., or more in the presence of oxygen or water vapor heated at 600° C. or more, heating the obtained powder at 300 to 600° C. to decrease the concentration of raw material-originated hydrogen halide in the powder to 1 mass % or less, and then subjecting the powder to a treatment of dissociating the aggregated or steric structure.</p>
申请公布号 DE60324709(D1) 申请公布日期 2008.12.24
申请号 DE2003624709 申请日期 2003.12.26
申请人 SHOWA DENKO K.K. 发明人 KOGOI, HISAO;TANAKA
分类号 A61K8/00;C01G23/07;A61K8/25;A61K8/29;A61Q1/00;A61Q1/02;A61Q1/12;A61Q17/04;A61Q19/00;B01J35/02;C01B33/18;C01G23/00;C08K3/22;C08K3/36;C08L83/00;C08L93/00;C08L101/00;C09C1/36;C09D7/12;H01G9/20 主分类号 A61K8/00
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