CURVED GROOVE PROCESSING OF POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To provide a method for forming groove patterns on a CMP polishing pad using a CNC machining device and a lathe using a rotary bit capable of manufacturing the grooved CMP polishing pad more while keeping allowable quality more efficiently and at higher manufacturing rate.

SOLUTION: This method for forming grooves on a polishing pad 14 is effective for flattening a substrate in a chemical machine flattening process. In this method, grooves can be formed using a rotary bit by keeping average speed according to a bit diameter. Therefore, the grooves can be formed at higher speed while maintaining quality of the groove and reducing defects.

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