| 发明名称 | Lithographic apparatus and device manufacturing method | ||
| 摘要 | An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame. | ||
| 申请公布号 | US9494869(B2) | 申请公布日期 | 2016.11.15 |
| 申请号 | US201214357530 | 申请日期 | 2012.12.05 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | Butler Hans;Bleeker Arno Jan;Hennus Pieter Renaat Maria;Hoeks Martinus Hendricus Henricus;Hol Sven Antoin Johan;Van Der Schoot Harmen Klaas;Slaghekke Bernardus Antonius;Tinnemans Patricius Aloysius Jacobus;Van Der Wijst Marc Wilhelmus Maria;Zaal Koen Jacobus Johannes Maria;Cadee Theodorus Petrus Maria;Beerens Ruud Antonius Catharina Maria;Fischer Olof Martinus Josephus;Aangenent Wilhelmus Henricus Theodorus Maria;Bosch Niels Johannes Maria |
| 分类号 | G03B27/32;G03B27/44;G03B27/54;H02K5/24;G03F7/20 | 主分类号 | G03B27/32 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. An exposure apparatus, comprising: a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; an actuator system to cause the movable frame to rotate; and a controller to adjust a position of the movable frame and a modulation or intensity characteristic of at least one of the radiation beams, to compensate at least in part for imbalance of or applied to the movable frame or imbalance of or applied to another movable frame. | ||
| 地址 | Veldhoven NL | ||