| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a resin solution for a photoresist, by which thermal histories on a resin for a photoresist can be reduced compared to conventional methods and a resin solution for a photoresist can be efficiently produced.SOLUTION: The production method of a resin solution for a photoresist includes: a resin solution preparation step of preparing a resin solution containing a resin for a photoresist by polymerizing a polymerizable compound; a recovery step of recovering the resin included in the resin solution by reprecipitation; a cleaning step of subjecting the recovered resin to filtration and cleaning the resin by use of a cleaning solvent to obtain a wet powder containing the resin and the cleaning solvent; and a dissolution step of mixing the wet powder with a solvent for the photoresist to dissolve the resin included in the wet powder into the solvent for the photoresist. The content percentage of the cleaning solvent included in the wet powder in the dissolution step is 25 to 80 mass% when the sum of the resin and the cleaning solvent is set to 100 mass%. In the dissolution step, the resin included in the wet powder is dissolved in the solvent for the photoresist under reduced pressure. |
