发明名称 SPLIT-GATE NONVOLATILE MEMORY AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To realize a fine structure of a nonvolatile memory with preventing the punch-through. SOLUTION: A split-gate memory cell (1) has a first and second diffused regions (3), (4) and a channel region (10) between the first and second diffused regions (3), (4). The channel region (10) includes a first channel region (13) having a specified impurity concentration. The first channel region (13) is provided apart from the first and second diffused regions (3), (4). COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008047726(A) 申请公布日期 2008.02.28
申请号 JP20060222323 申请日期 2006.08.17
申请人 NEC ELECTRONICS CORP 发明人 SHIMIZU MASAKUNI
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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