Modified surface for block copolymer self-assembly

摘要

A method of self-assembling density multiplied block copolymers (BCP) structures includes applying a block copolymer (BCP) to a feature-imprinted resist layer. The BCP is thermally annealed to laterally segregate the BCP into self-assembled columns of a first polymer block surrounded by a second polymer block.

主权项

1. A method comprising
modifying a surface of a first layer comprising a first pattern of features at a first feature density, wherein the first layer overlies an underlying substrate; depositing a block copolymer composition over the first layer; annealing the block copolymer composition to self-assemble a first polymer block and a second polymer block,
wherein the first polymer block has a chemical preference for forming over the features of the first layer; removing the first polymer block to form a second layer comprising a second pattern of features at a second feature density, wherein
the first pattern of features includes pillar features,the removing the first polymer block exposes the first pattern of features of the first layer within the second pattern of features, andthe second feature density is greater than the first feature density; and removing the first pattern of features of the first layer from the second pattern of features, wherein removing the first pattern of features exposes the underlying substrate.