| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern inspecting apparatus for precisely and efficiently detecting a defect, and inspecting a pattern of a semiconductor device. SOLUTION: The pattern inspecting apparatus is provided with an outline extracting means for extracting outline data of the pattern from a photographed picture of the semiconductor device, a non-linear part extracting means for extracting a non-linear part from outline data, a corner extracting means for extracting a corner of the pattern from design data of the semiconductor device, and a defect detecting means for comparing a position of the non-linear part from the non-linear part extracting means with a position of the corner from the corner extracting means and detecting a position of a defect of the pattern. COPYRIGHT: (C)2008,JPO&INPIT
|
