Charged particle beam writing method, computer-readable recording medium, and charged particle beam writing apparatus

摘要

A charged particle beam writing method according to embodiments of the present disclosure includes: storing in a charged particle beam writing apparatus a position coordinate at which a drift amount is diagnosed; storing in the charged particle beam writing apparatus first and second time interval patterns which define time intervals to diagnose the drift amount of the charged particle beam; performing first writing of irradiating a target object with the charged particle beam, and writing a writing pattern on the target object while diagnosing the drift amount based on the first time interval pattern during the writing; and performing second writing of writing a predetermined writing pattern while diagnosing the drift amount when the writing reaches the position coordinate and diagnosing the drift amount based on the second time interval pattern during the writing after the writing reaches the position coordinate.

主权项

1. A charged particle beam writing method comprising:
storing in a charged particle beam writing apparatus a specific position coordinate; storing in the charged particle beam writing apparatus a first time interval pattern defining first time intervals to diagnose a drift amount of a charged particle beam and a second time interval pattern associated with the specific position coordinate and defining second time intervals to diagnose a drift amount of the charged particle beam; performing a first writing by irradiating a target object with the charged particle beam using the charged particle beam writing apparatus, and writing a first predetermined writing pattern on the target object diagnosing a drift amount of the charged particle beam repeatedly with the first time intervals defined in the first time interval pattern during the first writing; diagnosing a drift amount of the charged particle beam when the first writing reaches the specific position coordinate; and performing a second writing by irradiating the target object with the charged particle beam after the first writing reaches the specific position coordinate, and writing a second predetermined writing pattern on the target object diagnosing a drift amount of the charged particle beam repeatedly with the second time intervals defined in the second time interval pattern during the second writing, wherein the first time intervals increase as time passes since start of application of the first interval pattern, and the second time intervals increase as time passes since start of application of the second interval pattern.