发明名称 Acoustic wave etch rate sensor system
摘要 An acoustic wave sensor system for monitoring the etch rate or etchability of a selective material has an acoustic wave sensing device having a piezoelectric substrate and at least one electrode coupled to the substrate for generating a propagating acoustic wave and for detecting changes in frequency or other propagation characteristics of the acoustic wave. A selective material is disposed on the substrate. Changes in propagation characteristics of the wave caused by etching of the selective material by an etchant can be analyzed to evaluate the etching rate or etchability of the selective material. The sensing system can have a wireless sensing device which device is mountable in an oil filter system for monitoring the corrosion of the engine. The sensing device can be configured as BAW, SH-SAW, SH-APM, FPM devices or other acoustic wave devices.
申请公布号 US2006283249(A1) 申请公布日期 2006.12.21
申请号 US20050156012 申请日期 2005.06.16
申请人 HONEYWELL INTERNATIONAL INC. 发明人 LIU JAMES Z.;RHODES MICHAEL L.;RAHMAN AZIZ
分类号 G01H13/00 主分类号 G01H13/00
代理机构 代理人
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