发明名称 |
CERAMIC COATING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS |
摘要 |
Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment. A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIa of the Periodic Table coated directly or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.
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申请公布号 |
US2007218302(A1) |
申请公布日期 |
2007.09.20 |
申请号 |
US20070688565 |
申请日期 |
2007.03.20 |
申请人 |
TOCALO CO., LTD. |
发明人 |
KOBAYASHI YOSHIYUKI;MURAKAMI TAKAHIRO;HARADA YOSHIO;TAKEUCHI JUNICHI;YAMASAKI RYO;KOBAYASHI KEIGO |
分类号 |
B32B15/04 |
主分类号 |
B32B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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