| 摘要 |
PROBLEM TO BE SOLVED: To provide a heater to treat material coated with a resist which can detect rapidly the change of an atmosphere in a heating part to be treated when the material coated with the resist is heat treated, and to provide a method of monitoring the same. SOLUTION: The heater of the material coated with the resist includes a heating unit 1a which disposes and heats a semiconductor wafer 4 coated with the resist in an interior, a purge pump 7 which ejects gas 8a around the heated semiconductor wafer 4 to the exterior of the heating unit 1a, a gas discharge flowmeter 11 for measuring the gas discharge flow rate of the gas 8a to be ejected, and a data logger 12 which outputs as data a measured value measured with the gas discharge flowmeter 11. COPYRIGHT: (C)2005,JPO&NCIPI
|
