| 摘要 |
PROBLEM TO BE SOLVED: To obtain a new photosensitive lithographic printing plate without using a photopolymerizable compsn. by applying a compsn. containing a film- forming matrix material and particles and/or a sol having a photocatalytic function. SOLUTION: This photosensitive lithographic printing plate is produced by applying a compsn. containing a film-forming matrix material and fine particles and/or a sol having a photocatalytic function. As for the film-forming matrix material, especially polyorganosiloxane is preferable. The coating compsn. contains the polyorganosiloxane being a hydrolyzed product of organosilane expressed by (R1)nSi(OR2)4-n and/or its partial condensate, fine particles and/or sol having a photocatalytic function, and water and/or org. solvent. In the formula, R1 is hydrogen atom or a univalent org. group, R2 is an alkyl group, acyl group or phenyl group, and n is an integer 0, 1 or 2. |
