发明名称 |
Photo-Mask and Wafer Image Reconstruction |
摘要 |
A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
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申请公布号 |
US2010021042(A1) |
申请公布日期 |
2010.01.28 |
申请号 |
US20090475338 |
申请日期 |
2009.05.29 |
申请人 |
PREIL MOSHE E;HEGYI ALEX N;ABRAMS DANIEL S |
发明人 |
PREIL MOSHE E.;HEGYI ALEX N.;ABRAMS DANIEL S. |
分类号 |
G06T7/00 |
主分类号 |
G06T7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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