发明名称 SUBSTRATE WITH REFLECTIVE MULTILAYER FILM, REFLECTIVE MASK BLANK, AND REFLECTIVE MASK
摘要 <p><P>PROBLEM TO BE SOLVED: To provide materials for a multilayer protective film which provides protection against oxidation without deteriorating its reflectance. <P>SOLUTION: In the reflective multilayer film which is formed by alternatively accumulating materials having relatively high reflectance and low reflectance at the wavelength of incident light, each protective film is made of (a) a single element of Zr, Nb, Y, La, Rh, Ti, or B, (b) a material containing at least one of Zr, Nb, Y, La, Rh, Ti, Si, or Mo as a main component, or (c) a material containing Si and B as main components. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004363570(A) 申请公布日期 2004.12.24
申请号 JP20040141009 申请日期 2004.05.11
申请人 HOYA CORP 发明人 HOSOYA MORIO;KINOSHITA TAKESHI;SHIYOUKI TSUTOMU
分类号 G03F1/24;G03F1/54;G03F1/68;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 主分类号 G03F1/24
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