发明名称 |
METHOD FOR MANUFACTURING THIN FILM TRANSISTOR FOR LIQUID CRYSTAL DISPLAY USING ALUMINUM OXIDATION LAYER AS BUFFER LAYER |
摘要 |
PURPOSE: A method for manufacturing a TFT(Thin Film Transistor) for a LCD(Liquid Crystal Display) using an aluminum oxidation layer as a buffer layer is provided to prevent a thin film from being isolated, by forming a thin aluminum(Al2O3) layer on both sides of a metal thin film. CONSTITUTION: A first aluminum layer is formed on a glass substrate(1). The aluminum layer is oxidized. A gate metal(Ag-Pd-Cu)(4) is formed on the oxidized aluminum layer. The gate metal(4) is etched. A second aluminum layer is formed on the patterned gate metal. The aluminum layer is oxidized. A gate insulating layer, a semiconductor layer and a semiconductor layer injected with high density impurities are formed on the oxidized aluminum layer.
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申请公布号 |
KR20000072231(A) |
申请公布日期 |
2000.12.05 |
申请号 |
KR20000048048 |
申请日期 |
2000.08.19 |
申请人 |
JANG, JIN |
发明人 |
WOO, IN GEUN;LEE, SANG UK;JANG, JIN |
分类号 |
H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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