发明名称 |
Spacer etching process for integrated circuit design |
摘要 |
A method includes forming a first material layer on a substrate and performing a first patterning process using a first layout to form a first plurality of trenches in the first material layer. The method further includes performing a second patterning process using a second layout to form a second plurality of trenches in the first material layer, wherein the second layout a cut pattern for the first layout. The method further includes forming spacer features on sidewalls of both the first and second pluralities of trenches, wherein the spacer features have a thickness and the cut pattern corresponds to a first trench of the second plurality whose width is less than twice the thickness of the spacer features. The method further includes removing the first material layer; forming a second material layer on the substrate and within openings defined by the spacer features; and removing the spacer features. |
申请公布号 |
US9502261(B2) |
申请公布日期 |
2016.11.22 |
申请号 |
US201514850764 |
申请日期 |
2015.09.10 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
Liu Ru-Gun;Tsai Cheng-Hsiung;Lee Chung-Ju;Lai Chih-Ming;Lee Chia-Ying;Shieh Jyu-Horng;Hsieh Ken-Hsien;Shieh Ming-Feng;Shue Shau-Lin;Chang Shih-Ming;Bao Tien-I;Gau Tsai-Sheng |
分类号 |
H01L21/308;H01L21/033;H01L21/311;H01L21/768;H01L21/02;H01L21/027;H01L21/3105 |
主分类号 |
H01L21/308 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A method, comprising:
forming a first material layer on a substrate; performing a first patterning process using a first layout to form a first plurality of trenches in the first material layer, the first layout including a first subset of a target pattern; performing a second patterning process using a second layout to form a second plurality of trenches in the first material layer, the second layout including a second subset of the target pattern and a cut pattern for the first subset; forming spacer features on sidewalls of both the first plurality of trenches and the second plurality of trenches, the spacer features having a thickness, wherein the cut pattern corresponds to a first trench of the second plurality whose width is less than twice the thickness of the spacer features; removing the first material layer; forming a second material layer on the substrate and within openings defined by the spacer features; and removing the spacer features. |
地址 |
Hsin-Chu TW |