| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which enables formation of a chemically amplified resist having excellent resolution performance and small nano edge roughness. <P>SOLUTION: The radiation-sensitive resin composition comprises (A) a radiation-sensitive acid generator having a partial structure represented by general formula (1) and (B) a resin. In general formula (1), R<SP>1</SP>represents a univalent hydrocarbon group or the like. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010044374(A) |
申请公布日期 |
2010.02.25 |
| 申请号 |
JP20090164814 |
申请日期 |
2009.07.13 |
| 申请人 |
JSR CORP |
发明人 |
SHIMOKAWA TSUTOMU;EHATA TAKUMA;SAKAI KAORI |
| 分类号 |
G03F7/004;C07C19/07;C07C309/12;C07C381/12;C08F20/10;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
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