METHOD FOR EXPOSING A ELECTRON BEAM AND SUBSTRATE MANUFACTURING METHOD INCLUDING THE SAME

摘要

The present invention relates to a method for exposing an electron beam and to a substrate manufacturing method including the same. The method for exposing an electron beam includes the following steps of: designing a target pattern to be formed on a substrate; deriving a first dose map having first dose values of the beams to be provided to a photoresist formed on the substrate; and deriving a second dose map having second dose values which increase and decrease more than the first dose values by overlapping of the beams.