| 发明名称 |
CHEMICAL ETCHING METHOD FOR SILICON USING GRAPHENE AS CATALYST |
| 摘要 |
Provided is a chemical etching method for silicon using graphene as a catalyst, which reduces the economic cost burden as use is made of a catalyst of graphene which is not a precious metal, and which is relatively safe as there is no use of any highly toxic strongly acidic solution. |
| 申请公布号 |
WO2016178452(A1) |
申请公布日期 |
2016.11.10 |
| 申请号 |
WO2015KR05501 |
申请日期 |
2015.06.02 |
| 申请人 |
UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY |
发明人 |
CHOI, Suk Ho;KIM, Jung Kil |
| 分类号 |
C23F1/10;C23F1/24 |
主分类号 |
C23F1/10 |
| 代理机构 |
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