| 摘要 |
PROBLEM TO BE SOLVED: To provide a test device and a test method for irradiating a substrate surface having a circuit pattern such as a semiconductor device with white light, laser beams, or electron beams for quickly and highly precisely observing, testing, and distinguishing detected surface roughness, shape defect, foreign matter, electrical defect and the like by means of the same device and allowing automated movement to an observed position, image capture, and classification. SOLUTION: When an electron beam radiation condition, a detector, a detection condition and the like are designated according to the type of a defect to be observed in formation of an image formed by irradiating an observed position, which is specified based on positional information about the defect tested and detected by another test device, on a sample, an electrical defect can be observed with potential contrast. An acquired image is automatically sorted by an image processing part, and the result is added to a defect file to be outputted. COPYRIGHT: (C)2006,JPO&NCIPI
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