发明名称 Thin film including multi components and method of forming the same
摘要 A thin film including multi components and a method of forming the thin film are provided, wherein a method according to an embodiment of the present invention, a substrate is loaded into a reaction chamber. A unit material layer is formed on the substrate. The unit material layer may be formed of a mosaic atomic layer composed of two kinds of precursors containing components constituting the thin film. The inside of the reaction chamber is purged, and the MAL is chemically changed. The method of forming the thin film of the present invention requires fewer steps than a conventional method while retaining the advantages of the conventional method, thereby allowing a superior thin film yield in the present invention than previously obtainable.
申请公布号 US7709377(B2) 申请公布日期 2010.05.04
申请号 US20050176657 申请日期 2005.07.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE JUNG-HYUN;KIM DAE-SIG;MIN YO-SEP;CHO YOUNG-JIN
分类号 C23C16/44;H01L21/469;C23C16/30;C23C16/34;C23C16/40;C23C16/455;H01L21/316;H01L21/4763 主分类号 C23C16/44
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