发明名称 ガス製造装置
摘要 A gas production apparatus is provided which include: an element laminate having a light receiving section on one side and a conductive substrate on the other, in which laminate a plurality of elements, each including a semiconductor thin film with pn junction, are so laminated on each other as to connect in series to each other; a hydrogen gas generator formed on a surface of a first element located on the light receiving section side; a first electrolysis chamber including the hydrogen gas generator; an oxygen gas generator formed on a back surface of the conductive substrate; a second electrolysis chamber including the oxygen gas generator; and an ion-permeable but gas-impermeable diaphragm provided between the first and second electrolysis chambers.
申请公布号 JP5993768(B2) 申请公布日期 2016.09.14
申请号 JP20130068993 申请日期 2013.03.28
申请人 富士フイルム株式会社;人工光合成化学プロセス技術研究組合 发明人 佐藤 尚俊
分类号 C25B9/00;C25B11/06 主分类号 C25B9/00
代理机构 代理人
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