APPARATUS AND PROCESS FOR ANNEALING OF ANTI-FINGERPRINT COATINGS

摘要

The present invention addresses an in-situ annealing station for treating a substrate in an atmosphere of controlled water vapour pressure at a defined temperature. Such a station can be integrated as a process chamber into a multi chamber processing tool in which an anti-fingerprint coating process is being performed. The substrate is always under vacuum conditions until the annealing process has finished. Experimental data show that a significant reduction of the subsequent ex-situ curing duration can be achieved compared to Prior Art by introducing this in-situ treatment in water vapour immediately after the anti-fingerprint coating step.;The invention further addresses a deposition process for a substrate to be annealed by exposing it to water-vapour under sub atmospheric pressure at a temperature of ca. 130° C. for about 5 s.

主权项

1. An annealing apparatus (10) for simultaneously heating a substrate and charging it with water vapour, comprising
An annealing chamber (15) with an adjustable and controllable supply of water into said chamber; and Means for evacuating said chamber to a predefined pressure level; and Heating means allowing for elevating the temperature of a substrate (16) arranged in said chamber.