发明名称 SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a transparent conductive oxide thin film higher in light transmittance and conductivity.SOLUTION: The sputtering target including ZnO of 65-88 mol%, GaOof 10-25 mol% and at least one kind of oxides selected from MgO, CaO and BaO has a structure which particles using GaOas a principal component and particles using at least one kind of oxides selected from MgO, CaO and BaO as a principal component are dispersed in a matrix using ZnO as a principal component. The total content of MgO, CaO and BaO is 1-17 mol %, and both of the particles using GaOas a principal component and the particles using the at least one kind of oxides selected from MgO, CaO and BaO as a principal component have an average particle size of 1.5-10 μm.SELECTED DRAWING: Figure 1
申请公布号 JP2016089238(A) 申请公布日期 2016.05.23
申请号 JP20140227077 申请日期 2014.11.07
申请人 TDK CORP 发明人 KIUCHI KENICHI;KAWAGUCHI YUKIO;IINO MINORU
分类号 C23C14/34;C04B35/453 主分类号 C23C14/34
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