发明名称 |
Photomask blank and photomask |
摘要 |
A photomask blank comprising a transparent substrate on which are formed at least one light-shielding film and at least one antireflective film minimizes film stress and eliminates substrate warp following deposition of the light-shielding film and the antireflective film, when each film is composed of a CrCO layer, a CrCON layer, or a combination of CrCO and CrCON layers. The photomask blank can be accurately patterned without distortion to give a photomask. |
申请公布号 |
US2001044054(A1) |
申请公布日期 |
2001.11.22 |
申请号 |
US20010840097 |
申请日期 |
2001.04.24 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KANEKO HIDEO;INAZUKI YUKIO;OKAZAKI SATOSHI |
分类号 |
C23C14/06;G02B1/11;G03F1/08;G03F1/14;G03F1/46;G03F1/50;G03F1/54;H01L21/027;(IPC1-7):B32B15/00;B32B17/06;G03F9/00 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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