发明名称 METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 The present disclosure relates to a method of producing a microfluidic device, a microfluidic device, and a photosensitive resin composition, the method including the steps of: forming a resin layer on a support from a photosensitive resin composition that includes a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; partially UV-exposing and developing the resin layer; preparing a laminate by placing a cover material on the thus developed resin layer; and UV-exposing the thus obtained laminate.
申请公布号 US2016310944(A1) 申请公布日期 2016.10.27
申请号 US201615133202 申请日期 2016.04.19
申请人 JSR CORPORATION 发明人 NISHIMURA Isao;HOSHIKO Kenji;KANEKO Masahiro
分类号 B01L3/00;B32B37/14;B32B38/00;G03F7/031 主分类号 B01L3/00
代理机构 代理人
主权项 1. A method of producing a microfluidic device, said method comprising: a step (1) of forming a resin layer on a support from a photosensitive resin composition that comprises a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; a step (2) of partially UV-exposing and developing said resin layer; a step (3) of preparing a laminate by placing a cover material on the thus developed resin layer; and a step (4) of UV-exposing the thus obtained laminate.
地址 Tokyo JP