发明名称 |
METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
The present disclosure relates to a method of producing a microfluidic device, a microfluidic device, and a photosensitive resin composition, the method including the steps of: forming a resin layer on a support from a photosensitive resin composition that includes a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; partially UV-exposing and developing the resin layer; preparing a laminate by placing a cover material on the thus developed resin layer; and UV-exposing the thus obtained laminate. |
申请公布号 |
US2016310944(A1) |
申请公布日期 |
2016.10.27 |
申请号 |
US201615133202 |
申请日期 |
2016.04.19 |
申请人 |
JSR CORPORATION |
发明人 |
NISHIMURA Isao;HOSHIKO Kenji;KANEKO Masahiro |
分类号 |
B01L3/00;B32B37/14;B32B38/00;G03F7/031 |
主分类号 |
B01L3/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method of producing a microfluidic device, said method comprising:
a step (1) of forming a resin layer on a support from a photosensitive resin composition that comprises a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; a step (2) of partially UV-exposing and developing said resin layer; a step (3) of preparing a laminate by placing a cover material on the thus developed resin layer; and a step (4) of UV-exposing the thus obtained laminate. |
地址 |
Tokyo JP |