| 摘要 |
An arc chamber for an ion implanter according to the present invention, which constitutes part of an ion source for an ion implanter and generates ions by generating an electric discharge in an inner space, comprises: a chamber body having an upper part opened and having a predetermined space formed therein to be able to generate an electric discharge; an upper cover of the chamber combined with the upper part of the chamber body and having a first slit capable of extracting ions generated by an electric discharge; a cathode fixated to one side of the chamber body and emitting electrons into the inner space of the chamber body; a repeller fixated to another side of the chamber body and facing the cathode to repel the electrons; a thermoelectron emitting filament for heating the cathode by colliding the electrons against the cathode; a cathode clamp for fixating the cathode and functioning as a conducting wire for applying a predetermined voltage by being in contact with the cathode; a repeller clamp for applying a predetermined voltage by being in contact with the repeller; and a filament clamp for applying a predetermined voltage by being in contact with the filament. The cathode includes: an outer side part for providing an inner space where the filament can be installed; and an electron emitting surface for emitting electrons. The cathode clamp fixates the cathode while enveloping the outer side part of the cathode. |
