发明名称 |
Mask |
摘要 |
The present invention provides a mask, on which a preset pattern is provided. First test patterns for determining an amount of a position offset of the mask during its movement are provided on the mask at a first side of the preset pattern and a second side of the preset pattern opposite to the first side, respectively. When being moved in a direction from the first side to the second side by a standard distance, the mask can determine whether a position offset occurs to the mask during its movement, and determine an amount of the position offset if a position offset occurs. Thus, the position offset of the mask can be corrected, thereby obtaining an accurate predetermined pattern on a glass substrate. |
申请公布号 |
US9409204(B2) |
申请公布日期 |
2016.08.09 |
申请号 |
US201414546237 |
申请日期 |
2014.11.18 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD.;BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
Guo Jian |
分类号 |
B05C21/00;H01L21/308;G03F1/42;G03F1/70;G03F1/44 |
主分类号 |
B05C21/00 |
代理机构 |
Nath, Goldberg & Meyer |
代理人 |
Nath, Goldberg & Meyer ;Goldberg Joshua B.;Thomas Christopher |
主权项 |
1. A mask, on which a preset pattern is provided, wherein, first test patterns for determining an amount of a position offset of the mask during its movement are provided on the mask at a first side of the preset pattern and a second side of the preset pattern opposite to the first side, respectively,
wherein, each of the first test patterns is provided with a plurality of tags which are arranged in a first direction from the first side to the second side, and the tags in the first test pattern located at the first side and the tags in the first test pattern located at the second side are mirror-symmetric with respect to the first direction, wherein, the plurality of tags have different preset widths, and the preset widths of the tags in each of the first test patterns progressively increase or progressively decrease in the first direction; wherein the preset widths of the tags in each of the first test patterns range from 1.0 μm to 3.0 mm; wherein the plurality of tags provided on the first test patterns at the first side and the second side of the preset pattern comprise openings between adjacent tags, wherein the openings are non-through holes which do not penetrate through the first test patterns, and wherein the openings on the first side of the preset pattern are in a direction opposite the openings on the second side of the preset pattern. |
地址 |
Beijing CN |