发明名称 SYSTEMS AND METHODS FOR PATTERNING COMPOSITE MATERIALS AND FABRICATING ILLUMINATION SYSTEMS
摘要 In accordance with certain embodiments, patterns are formed in composite materials by selectively urging one or more regions of the composite material toward an abrasion head, whereby the abrasion head mechanically removes portions of a patternable material from the composite material in each region.
申请公布号 US2016219722(A1) 申请公布日期 2016.07.28
申请号 US201615005396 申请日期 2016.01.25
申请人 TISCHLER Michael A.;SHEEN Calvin Wade 发明人 TISCHLER Michael A.;SHEEN Calvin Wade
分类号 H05K3/46;H05K3/30;H05K3/00;H05K3/04 主分类号 H05K3/46
代理机构 代理人
主权项 1. A method of forming a pattern in a composite material, the composite material comprising a substrate and a patternable material disposed thereover, the method comprising: (a) disposing a portion of the composite material proximate an abrasion head; (b) selectively urging one or more regions of the portion of the composite material toward the abrasion head, whereby the abrasion head mechanically removes at least a portion of the patternable material in each of the one or more regions; (c) translating the composite material with respect to the abrasion head, thereby disposing a new portion of the composite material proximate the abrasion head; and (d) repeating steps (b) and (c) one or more times to form the pattern.
地址 Vancouver CA