发明名称 Semiconductor device and fabrication method thereof
摘要 A semiconductor device and a fabrication method thereof are provided. A semiconductor device which is packaged as it includes a semiconductor in which an electronic circuit is disposed, the semiconductor device including: a substrate; a semiconductor chip which has a semiconductor main body having the electronic circuit formed thereon, a pad electrode formed on the semiconductor main body and a projected electrode that is connected to the pad electrode and projected from a surface of the semiconductor main body, wherein the semiconductor chip is mounted on the substrate from the back side of the surface to form the projected electrode thereon; and an insulating layer which is formed as the semiconductor chip buried therein and is polished from a top surface of the insulating layer to a height at which a top of the projected electrode is exposed.
申请公布号 US7892887(B2) 申请公布日期 2011.02.22
申请号 US20100656621 申请日期 2010.02.04
申请人 SONY CORPORATION 发明人 YAMAGATA OSAMU
分类号 H01L21/66;H01L21/00;H01L21/44;H01L21/4763;H01L21/48;H01L21/50 主分类号 H01L21/66
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