SUPPRESSION OF PARASITIC DEPOSITION IN A SUBSTRATE PROCESSING SYSTEM BY SUPPRESSING PRECURSOR FLOW AND PLASMA OUTSIDE OF SUBSTRATE REGION

摘要

A substrate processing system includes a showerhead that comprises a base portion and a stem portion and that delivers precursor gas to a chamber. A collar connects the showerhead to an upper surface of the chamber. The collar includes a plurality of slots, is arranged around the stem portion of the showerhead, and directs purge gas through the plurality of slots into a region between the base portion of the showerhead and the upper surface of the chamber.

主权项

1. A method for operating a substrate processing system, comprising:
delivering precursor gas to a chamber using a showerhead, wherein the showerhead includes a base portion and a stem portion; connecting the showerhead to an upper surface of the chamber using a collar, wherein the collar is arranged around the stem portion of the showerhead; and supplying a purge gas through slots of the collar into a region between the base portion of the showerhead and the upper surface of the chamber.