Arrangement of beam shaper and beam deflector, beam deflecting method, ion implantation method, and ion implantation system

摘要

The present invention provides for a beam deflecting method, beam deflector, ion implantation method, and ion implantation system in which a beam deflector for scanning performs deflection of a charged particle beam having a regular trajectory in a vacuum space to thereby periodically change the trajectory of the charged particle beam. The beam deflector comprises a pair of deflection electrodes disposed so as to confront each inner electrode surface having a symmetrical concave extending in a direction of a beam trajectory.