发明名称 |
Semiconductor wafer cleaning apparatus |
摘要 |
<p>A wafer transfer device or boat and semiconductor cleaning apparatus including a wafer transfer device and a heatable reaction core is provided. The wafer transfer device has a first unit with a plurality of first slots for receiving a first group of semiconductor wafers and a second unit with a plurality of slots for receiving a second group of semiconductor wafers. The first slots alternate with the second slots. The first unit is connectable to a first voltage source and the second unit is connectable to a second voltage source. The second voltage source is more electronegative than the first one, Typically, the first group of semiconductor wafers have impurities therein which are to be removed and the second group of semiconductor wafers are to receive the impurities. <IMAGE></p> |
申请公布号 |
EP0883162(A2) |
申请公布日期 |
1998.12.09 |
申请号 |
EP19980304401 |
申请日期 |
1998.06.04 |
申请人 |
SIZARY LIMITED |
发明人 |
ZINMAN, YOSEF;KORCHMAR, ILYA;SERGIENKO, ALEX;RAVID, ARIE;SCHOICHET, LEV |
分类号 |
H01L21/677;H01L21/00;H01L21/304;H01L21/306;H01L21/673;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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