METHOD FOR PRODUCING A MIRROR ELEMENT

摘要

A method for producing a mirror element, in particular for a microlithographic projection exposure apparatus includes: providing a substrate (101, 102, 103, 104, 201, 202, 301, 302, 401, 402, 501, 502, 801, 901, 951, 961); and forming a layer stack (111, 112, 113, 114, 211, 212, 311, 312, 411, 412, 511, 512) on the substrate, wherein the layer stack is formed so that a setpoint curvature of the mirror element for a predetermined operating temperature is generated by a bending force exerted by the layer stack, wherein the substrate has a curvature deviating from the setpoint curvature of the mirror element prior to the formation of the layer stack, and wherein the bending force exerted by the layer stack is at least partly generated by virtue of a post-treatment for changing the layer tension of the layer stack.

主权项

1. A method for producing a mirror element, comprising:
a) providing a substrate; and b) forming a layer stack on the substrate, wherein the layer stack has at least one reflection layer system; c) wherein the layer stack is formed such that a setpoint curvature of the mirror element for a predetermined operating temperature is generated by a bending force exerted by the layer stack, wherein the substrate has an actual curvature deviating from the setpoint curvature of the mirror element prior to the said forming of the layer stack, and wherein the bending force exerted by the layer stack is at least partly generated by performing a post-treatment for changing a layer tension of the layer stack.