发明名称 X-RAY OPTICAL SYSTEM
摘要 PROBLEM TO BE SOLVED: To acquire selectively a linear X-ray beam or a point-shaped X-ray beam, while using an X-ray source for generating an X-ray beam having a linear section, and to enhance the X-ray intensity per unit area when the point-shaped X-ray beam is selected. SOLUTION: This X-ray optical system is equipped with the X-ray source 10, a paraboloidal multilayered film mirror 18 having an aperture slit plate 14 attached thereto, an optical path selection slit device 22, a polycapillary 36, and an outgoing width restriction slit 38. The polycapillary 36 and the outgoing width restriction slit 38 are inserted detachably into a route of a parallel beam 20 going out from the paraboloidal multilayered film mirror 18, and can be removed from the route. Then, a solar slit 26 and a divergent slit 28 can be inserted into the vacant spot. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008096180(A) 申请公布日期 2008.04.24
申请号 JP20060276135 申请日期 2006.10.10
申请人 RIGAKU CORP 发明人 MATSUO RYUJI;ECHIZENYA HIKARI;FUJINAWA TAKESHI
分类号 G01N23/207;G01N23/201;G21K1/02;G21K1/06 主分类号 G01N23/207
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