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发明名称
CHEMICAL VAPOR DEPOSITION OF TITANIUM ON A WAFER COMPRISING AN IN-SITU PRECLEANING STEP
摘要
申请公布号
KR20010032726(A)
申请公布日期
2001.04.25
申请号
KR1020007006015
申请日期
2000.06.02
申请人
发明人
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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