EPI BASE RING

摘要

Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.

主权项

1. A base ring assembly for a substrate processing chamber, comprising:
a ring body to be disposed within an inner circumference of the substrate processing chamber, the ring body having:
a substrate loading port;a gas inlet;a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body;a first trench formed in a top surface of the ring body; anda second trench formed in a bottom surface of the ring body; a first ring disposed within the first trench of the ring body, the first ring and the first trench defining a first annular channel therebetween; a first wall extending upwardly from the top surface of the ring body, wherein the first wall is disposed around an inner circumference of the ring body, and an outer portion of the first wall and an inner portion of the first ring define a first annular trench; a second ring disposed within the second trench of the ring body, the second ring and the second trench define a second annular channel therebetween; and a second wall extending downwardly from the bottom surface of the ring body, wherein the second wall is disposed around an inner circumference of the ring body, and an outer portion of the second wall and an inner portion of the second ring defines a second annular trench.