发明名称 |
FABRICATION OF MESOSCOPIC LORENTZ MAGNETORESISTIVE STRUCTURES |
摘要 |
A Lorentz Magnetoresistive sensor having an extremely small lead width and lead spacing is disclosed. The sensor can be constructed by a novel fabrication method that allows the leads to be deposited in such a manner that lead width and spacing between the leads is determined by the as deposited thicknesses of the lead layers and electrically insulating spacer layers between the leads rather than by photolithography. Because the lead thicknesses and lead spacings are not defined photolithograhically, the lead thickness and lead spacing are not limited by photolithographic resolution limits.
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申请公布号 |
US2009073615(A1) |
申请公布日期 |
2009.03.19 |
申请号 |
US20070857393 |
申请日期 |
2007.09.18 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES |
发明人 |
GURNEY BRUCE ALVIN;MARINERO ERNESTO E.;TROUP ANDREW STUART;WILLIAMS DAVID ARFON;WUNDERLICH JOERG |
分类号 |
G11B5/33 |
主分类号 |
G11B5/33 |
代理机构 |
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代理人 |
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地址 |
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