发明名称 |
Optical structure and method for its production |
摘要 |
PCT No. PCT/DE96/01256 Sec. 371 Date Jan. 7, 1998 Sec. 102(e) Date Jan. 7, 1998 PCT Filed Jul. 11, 1996 PCT Pub. No. WO97/04340 PCT Pub. Date Feb. 6, 1997An optical structure which is suitable as an optical waveguide or cavity comprises a carrier having a lattice structure with a photonic band gap and a defect region. The lattice structure comprises pores which have constriction and are arranged in a periodic grid pattern which is disturbed in the defect region. The optical structure can be produced by the electrochemical etching of silicon.
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申请公布号 |
US5987208(A) |
申请公布日期 |
1999.11.16 |
申请号 |
US19980983435 |
申请日期 |
1998.01.07 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
GRUENING, ULRIKE;LEHMANN, VOLKER |
分类号 |
G02B6/12;G02B5/18;G02B6/122;G02B6/124;G02B6/13;G02B6/136;H01L21/3063;H01S5/00;(IPC1-7):G02B6/10 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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