发明名称 MEMORY DEVICE HAVING ONLY THE TOP POLY CUT
摘要 Methods and apparatuses are contemplated herein for enhancing the efficiency of nonvolatile memory devices. In an example embodiment, a nonvolatile memory device comprises a substrate and 3D array of nonvolatile memory cells, the 3D array including a plurality of conductive layers, separated from each other by insulating layers, the plurality of conductive layers comprising a top layer, the top layer comprising n string select lines (SSLs) and one or more bottom layers, the top layer further comprises n−1 cuts, each cut electrically separating two SSLs, wherein each cut is cut to a depth of the top layer and not extending into the bottom layers and a plurality of vertical channels arranged orthogonal to the plurality of layers, each of the plurality of channels comprising a string of memory cells, each of plurality of strings coupled to a bit line, an SSL and one or more word lines.
申请公布号 US2016372198(A1) 申请公布日期 2016.12.22
申请号 US201514742944 申请日期 2015.06.18
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LEE Chih-Wei;KU Shaw-Hung;CHENG Cheng-Hsien
分类号 G11C16/04;H01L21/768;G11C16/08;H01L27/115 主分类号 G11C16/04
代理机构 代理人
主权项 1. A structure of a memory device, the structure of the memory device comprising: a substrate; and a 3D array of nonvolatile memory cells, the 3D array including: a plurality of conductive layers, separated from each other by insulating layers, the plurality of conductive layers comprising a top layer, the top layer comprising n string select lines (SSLs) and one or more bottom layers,wherein the top layer further comprises n−1 cuts, each cut electrically separating two SSLs, wherein each cut is cut to a depth of the top layer thus not extending into the bottom layers.
地址 Hsin-chu TW