发明名称 |
METHODS AND APPARATUS FOR INCORPORATING NITROGEN IN OXIDE FILMS |
摘要 |
In a first aspect, a first method is provided. The first method includes the steps of (1) preconditioning a process chamber with an aggressive plasma; (2) loading a substrate into the process chamber; and (3) performing plasma nitridation on the substrate within the process chamber. The process chamber is preconditioned using a plasma power that is at least 150% higher than a plasma power used during plasma nitridation of the substrate. Numerous other aspects are provided. |
申请公布号 |
EP1900001(A2) |
申请公布日期 |
2008.03.19 |
申请号 |
EP20060760661 |
申请日期 |
2006.06.02 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SATO, TATSUYA;LIU, PATRICIA, M.;CHRISTODOULOU, FANOS |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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