发明名称 CONDUCTIVE PATTERN-FORMING COMPOSITION AND METHOD
摘要 <p>PURPOSE: A composition for forming conductive patterns is provided to miniaturize a conductive circuit, and to manufacture a semiconductor circuit with high reliability. CONSTITUTION: A composition for forming conductive patterns by mixing conductive particles with maximum diameter of 1 micron or less in a silicon rubber composition containing curable organopolysiloxane and a curing agent. The conductive particle is silica of which the surface is electroplated with metal. A forming method of the conductive patterns comprises a step of rubberization by spreading a composition for conductive pattern forming by a printing method, and curing the composition.</p>
申请公布号 KR20120094437(A) 申请公布日期 2012.08.24
申请号 KR20120015117 申请日期 2012.02.15
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 HAMADA YOSHITAKA;YAGIHASHI FUJIO
分类号 H01B1/20;B05D1/26;B05D5/12;B05D7/24;B41M5/00;C08K3/08;C08K9/02;C08L83/04;C09D11/00;C09D11/38;C09D11/52;H01B1/02;H01B1/22;H01B1/24;H01B13/00;H01L21/288;H05K1/09;H05K3/12 主分类号 H01B1/20
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