发明名称 |
CONDUCTIVE PATTERN-FORMING COMPOSITION AND METHOD |
摘要 |
<p>PURPOSE: A composition for forming conductive patterns is provided to miniaturize a conductive circuit, and to manufacture a semiconductor circuit with high reliability. CONSTITUTION: A composition for forming conductive patterns by mixing conductive particles with maximum diameter of 1 micron or less in a silicon rubber composition containing curable organopolysiloxane and a curing agent. The conductive particle is silica of which the surface is electroplated with metal. A forming method of the conductive patterns comprises a step of rubberization by spreading a composition for conductive pattern forming by a printing method, and curing the composition.</p> |
申请公布号 |
KR20120094437(A) |
申请公布日期 |
2012.08.24 |
申请号 |
KR20120015117 |
申请日期 |
2012.02.15 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HAMADA YOSHITAKA;YAGIHASHI FUJIO |
分类号 |
H01B1/20;B05D1/26;B05D5/12;B05D7/24;B41M5/00;C08K3/08;C08K9/02;C08L83/04;C09D11/00;C09D11/38;C09D11/52;H01B1/02;H01B1/22;H01B1/24;H01B13/00;H01L21/288;H05K1/09;H05K3/12 |
主分类号 |
H01B1/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|