| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pellet body for film vapor deposition for producing a gas barrier film having high reliability by stably reducing splash frequency and further increasing the evaporation rate of silicon oxide vapor, to provide a method for producing the same, and to provide a method for producing a silicon oxide vapor-deposited film. Ž<P>SOLUTION: Disclosed is a pellet body mainly composed of Si and O, and in which the O content is 37 to 45 mass%, BET specific surface area is 0.1 to 20 m<SP>2</SP>/g, bulk density is 0.5 to 1.5 g/cm<SP>3</SP>, and the maximum dimensions lie in the range of 2 to 50 mm. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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